Reactive sputter deposition and annealing of nanometer scale NiO thin films for metal-insulator-metal tunnel junction diodes Article

Singh, A, Bhansali, S, Barton, D et al. (2017). Reactive sputter deposition and annealing of nanometer scale NiO thin films for metal-insulator-metal tunnel junction diodes . THIN SOLID FILMS, 644 23-28. 10.1016/j.tsf.2017.06.063

keywords

  • Ellipsometry
  • MIIM
  • MIM
  • Materials Science
  • Materials Science, Coatings & Films
  • Materials Science, Multidisciplinary
  • Physical Sciences
  • Physics
  • Physics, Applied
  • Physics, Condensed Matter
  • Science & Technology
  • Sputter deposited
  • Technology
  • Thin films
  • Tunnel diode

Location

  • San Diego, CA

Digital Object Identifier (DOI)

publisher

  • ELSEVIER SCIENCE SA

start page

  • 23

end page

  • 28

volume

  • 644