In-situ thermal annealing of on-membrane silicon-on-insulator semiconductor-based devices after high gamma dose irradiation Article

Amor, S, Andre, N, Kilchytska, V et al. (2017). In-situ thermal annealing of on-membrane silicon-on-insulator semiconductor-based devices after high gamma dose irradiation . NANOTECHNOLOGY, 28(18), 10.1088/1361-6528/aa66a4

International Collaboration

cited authors

  • Amor, S; Andre, N; Kilchytska, V; Tounsi, F; Mezghani, B; Gerard, P; Ali, Z; Udrea, F; Flandre, D; Francis, LA

authors

publication date

  • May 5, 2017

published in

keywords

  • MEMS
  • MOSFET
  • Materials Science
  • Materials Science, Multidisciplinary
  • Nanoscience & Nanotechnology
  • Physical Sciences
  • Physics
  • Physics, Applied
  • Science & Technology
  • Science & Technology - Other Topics
  • Technology
  • gamma irradiation
  • harsh environment
  • micro-hotplate
  • silicon-on-insulator
  • thermal annealing

Digital Object Identifier (DOI)

publisher

  • IOP PUBLISHING LTD

volume

  • 28

issue

  • 18