Electro-optical reliability characterization of advanced Cu/low-k interconnects Conference

Guedj, C, Guillaumond, JF, Mondon, F et al. (2005). Electro-optical reliability characterization of advanced Cu/low-k interconnects . 584-585. 10.1109/RELPHY.2005.1493154

cited authors

  • Guedj, C; Guillaumond, JF; Mondon, F; Arnaud, L; Arnal, J; Reinhold, J; Torres, J

authors

date/time interval

  • April 17, 2005 -

publication date

  • January 1, 2005

keywords

  • Cu
  • Engineering
  • Engineering, Electrical & Electronic
  • Low-k
  • Physical Sciences
  • Physics
  • Physics, Applied
  • Science & Technology
  • Technology
  • characterization
  • dielectric
  • interfaces
  • optical
  • relaibility

Location

  • CA, San Jose

Digital Object Identifier (DOI)

International Standard Book Number (ISBN) 10

Conference

  • 43rd Annual IEEE International Reliability Physics Symposium

publisher

  • IEEE

start page

  • 584

end page

  • 585