Low Temperature (<100°C) Deposited Pyrochlore Films with High Capacitance (200 nF/cm2), Low Loss (0.003) and Low TCF (<100 ppm/C) for Integrating RF Components
Conference
Raj, P Markondeya, Hwang, Jin-Hyun, Jung, Hyung-Mi et al. (2008). Low Temperature (<100°C) Deposited Pyrochlore Films with High Capacitance (200 nF/cm2), Low Loss (0.003) and Low TCF (<100 ppm/C) for Integrating RF Components
. 688-+.
Raj, P Markondeya, Hwang, Jin-Hyun, Jung, Hyung-Mi et al. (2008). Low Temperature (<100°C) Deposited Pyrochlore Films with High Capacitance (200 nF/cm2), Low Loss (0.003) and Low TCF (<100 ppm/C) for Integrating RF Components
. 688-+.