Low temperature (<100°C) deposited pyrochlore films with high capacitance (200 nF/cm2), low loss (∼0.003) and low TCF (<100 ppm/C) for integrating RF components
Conference
Raj, PM, Hwang, JH, Jung, HM et al. (2008). Low temperature (<100°C) deposited pyrochlore films with high capacitance (200 nF/cm2), low loss (∼0.003) and low TCF (<100 ppm/C) for integrating RF components
. 688-693. 10.1109/ECTC.2008.4550047
Raj, PM, Hwang, JH, Jung, HM et al. (2008). Low temperature (<100°C) deposited pyrochlore films with high capacitance (200 nF/cm2), low loss (∼0.003) and low TCF (<100 ppm/C) for integrating RF components
. 688-693. 10.1109/ECTC.2008.4550047