DEVELOPMENTS IN INSITU ELLIPSOMETER MONITORING OF THIN-FILM GROWTH DURING REACTIVE ION PLATING DEPOSITION Conference

SAVRDA, S, HIMEL, MD, GUENTHER, KH et al. (1990). DEVELOPMENTS IN INSITU ELLIPSOMETER MONITORING OF THIN-FILM GROWTH DURING REACTIVE ION PLATING DEPOSITION . 1270 133-146. 10.1117/12.20372

cited authors

  • SAVRDA, S; HIMEL, MD; GUENTHER, KH; URBAN, FK

authors

date/time interval

  • March 12, 1990 -

publication date

  • January 1, 1990

keywords

  • Engineering
  • Engineering, Electrical & Electronic
  • Instruments & Instrumentation
  • Optics
  • Physical Sciences
  • Physics
  • Physics, Applied
  • Science & Technology
  • Technology

Location

  • NETHERLANDS, THE HAGUE

Digital Object Identifier (DOI)

International Standard Book Number (ISBN) 10

Conference

  • CONF ON OPTICAL THIN FILMS AND APPLICATIONS

publisher

  • SPIE - INT SOC OPTICAL ENGINEERING

start page

  • 133

end page

  • 146

volume

  • 1270