A novel method for the fabrication of high-aspect ratio C-MEMS structures Article

Wang, CL, Jia, GY, Taherabadi, LH et al. (2005). A novel method for the fabrication of high-aspect ratio C-MEMS structures . Journal of Microelectromechanical Systems, 14(2), 348-358. 10.1109/JMEMS.2004.839312

cited authors

  • Wang, CL; Jia, GY; Taherabadi, LH; Madou, MJ

publication date

  • April 1, 2005

published in

keywords

  • CARBON-FILMS
  • Engineering
  • Engineering, Electrical & Electronic
  • Instruments & Instrumentation
  • LAYERS
  • LITHOGRAPHY
  • Li intercalation
  • MICROSTRUCTURES
  • Nanoscience & Nanotechnology
  • PERFORMANCE
  • PYROLYZED PHOTORESIST
  • Physical Sciences
  • Physics
  • Physics, Applied
  • RADIATION
  • REDUCTION
  • RESIST
  • Science & Technology
  • Science & Technology - Other Topics
  • THICK
  • Technology
  • complex microelectromechanical systems (C-MEMS)
  • high-aspect ratio
  • microbattery
  • photoresist
  • pyrolysis
  • suspended structure

Digital Object Identifier (DOI)

start page

  • 348

end page

  • 358

volume

  • 14

issue

  • 2