Spatial-phase-locked electron-beam lithography (SPLEBL) developed to improve the pattern-placement accuracy of scanning-electron-beam lithography (SEBL) tools is presented.This mode of SPLEBL provides two dimensional sub-beam-step pattern placement, enen with the extremely poor signal-to-noise ratio (SNR). It is expected that the improvements to scintillator and light collection system will increase SNR and pattern-placement accuracy.