Effects of dielectric thickness and contact area on current-voltage characteristics of thin film metal-insulator-metal diodes Article

Krishnan, Subramanian, Stefanakos, Elias, Bhansali, Shekhar. (2008). Effects of dielectric thickness and contact area on current-voltage characteristics of thin film metal-insulator-metal diodes . THIN SOLID FILMS, 516(8), 2244-2250. 10.1016/j.tsf.2007.08.067

cited authors

  • Krishnan, Subramanian; Stefanakos, Elias; Bhansali, Shekhar

sustainable development goals

authors

publication date

  • February 29, 2008

published in

keywords

  • I-V characteristics
  • JUNCTIONS
  • MIM diode
  • Materials Science
  • Materials Science, Coatings & Films
  • Materials Science, Multidisciplinary
  • NIO
  • Ni-NiO-Cr
  • OXIDE
  • Physical Sciences
  • Physics
  • Physics, Applied
  • Physics, Condensed Matter
  • Science & Technology
  • THZ
  • TRANSPORT
  • Technology
  • current-voltage characteristics
  • thin film dielectric
  • tunnel diode

Digital Object Identifier (DOI)

publisher

  • ELSEVIER SCIENCE SA

start page

  • 2244

end page

  • 2250

volume

  • 516

issue

  • 8