Effect of current density and grain refining agents on pulsed electrodeposition of nanocrystalline nickel Article

Bhardwaj, M, Balani, K, Balasubramaniam, R et al. (2011). Effect of current density and grain refining agents on pulsed electrodeposition of nanocrystalline nickel . SURFACE ENGINEERING, 27(9), 642-648. 10.1179/026708410X12683118611185

International Collaboration

keywords

  • ALLOYS
  • COATINGS
  • Coercivity
  • Complexing agent
  • FILMS
  • MECHANICAL-PROPERTIES
  • Materials Science
  • Materials Science, Coatings & Films
  • NANOCOMPOSITE
  • Nanocrystalline nickel
  • Nanoindentation
  • OPTICAL-PROPERTIES
  • PARAMETERS
  • PLASMA
  • Pulsed current electrodeposition
  • SACCHARIN
  • SILICON
  • Science & Technology
  • Technology

Digital Object Identifier (DOI)

publisher

  • TAYLOR & FRANCIS LTD

start page

  • 642

end page

  • 648

volume

  • 27

issue

  • 9