Structure and electrical properties of pure and yttrium-doped HfO2 films by chemical solution deposition through layer by layer crystallization process Article

(2017). Structure and electrical properties of pure and yttrium-doped HfO2 films by chemical solution deposition through layer by layer crystallization process . MATERIALS & DESIGN, 376-381. 10.1016/j.matdes.2017.02.019

authors

publication date

  • April 15, 2017

published in

keywords

  • Electrical properties
  • Materials Science
  • Materials Science, Multidisciplinary
  • Pure and yttrium-doped HfO2
  • Science & Technology
  • THIN-FILMS
  • Thin films

Digital Object Identifier (DOI)

start page

  • 376

end page

  • 381