Influence of room-temperature oxidation on stability and performance of reactively sputtered TaN thin films for high-precision sheet resistors Article

Zhang, Mingzhen, Wang, Yue, Song, Shangzhi et al. (2024). Influence of room-temperature oxidation on stability and performance of reactively sputtered TaN thin films for high-precision sheet resistors . 46 10.1016/j.surfin.2024.104088

cited authors

  • Zhang, Mingzhen; Wang, Yue; Song, Shangzhi; Guo, Ruiqiang; Zhang, Wenbin; Li, Chengming; Wei, Junjun; Jiang, Puqing; Yang, Ronggui

authors

publication date

  • March 1, 2024

keywords

  • Chemistry
  • Chemistry, Physical
  • DEPOSITION
  • DIFFUSION BARRIER
  • ELECTRICAL-RESISTIVITY
  • FLOW RATIO
  • MECHANICAL-PROPERTIES
  • Materials Science
  • Materials Science, Coatings & Films
  • Oxidation
  • Physical Sciences
  • Physics
  • Physics, Applied
  • Physics, Condensed Matter
  • Science & Technology
  • Stability
  • TANTALUM NITRIDE
  • Tantalum nitride
  • Technology
  • Temperature coefficient of resistance
  • Thermal conductivity

Digital Object Identifier (DOI)

publisher

  • ELSEVIER

volume

  • 46