A Time-Dependent Model of Pulse-Modulated Dual Radio Frequency Capacitively Coupled Plasma Sheath
Article
Hossain, MM, Jahan, NA, Rahman, MT. (2021). A Time-Dependent Model of Pulse-Modulated Dual Radio Frequency Capacitively Coupled Plasma Sheath
. 47(10), 996-1006. 10.1134/S1063780X21330011
Hossain, MM, Jahan, NA, Rahman, MT. (2021). A Time-Dependent Model of Pulse-Modulated Dual Radio Frequency Capacitively Coupled Plasma Sheath
. 47(10), 996-1006. 10.1134/S1063780X21330011
Abstract: A time-dependent model of pulse-driven collisional inhomogeneous sheath is proposed for dual frequency (DF) capacitively coupled plasma (CCP). A pulse-modulated low frequency (lf) source and a high frequency (hf) source are concurrently applied to the power electrode. Ionfluid equations are used to calculate the spatio-temporal variation of sheath width and sheath potential. In this model, we excluded the time-dependent terms of ion fluid equations, whereas the electric field, ion motion and ion density are considered time-dependent. The predicted sheath potential and width are compared and collated with those of time-dependent continuous DF CCP collisional sheath and time-dependent pulse-driven DF CCP collisional sheath models. From the evaluation of temporal variation in sheath width and potential, it is observed that pulse-driven DF CCP predicts higher value of sheath parameters than conventional continuous RF-driven DF CCP. From the temporal variations of sheath width, it was found that duty cycle of pulse modulator significantly affects the sheath width when duty cycle is less than 50%. Moreover, wider sheath width and higher sheath potential can be achieved using both the pulse-modulated lf source and hf RF source.
