Carbon micro- and nanostructures has received widespread interest recently due to their potential applications in biomedical devices, chemical sensors, and microelectronics. In this work, we successfully fabricated carbon-micro and nano electromechanical systems (C-MEMS/NEMS) by UV/EB lithography and pyrolysis method. Our starting material is a negative photoresist, SU-8. We tried to solve charging problem by forming a thin metal layer before EB writing using various methods, such as EB evaporation, sputtering system and thermal evaporation. By partly depositing a thin layer of a metal to prevent the repelling of negative charged electrons, we have successfully formed various suspended carbon structures, such as bridges and networks.
