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Enhanced hole injection in a bilayer vacuum-deposited organic light-emitting device using a p-type doped silicon anode
Article
Zhou, X, He, J, Liao, LS
et al
. (1999). Enhanced hole injection in a bilayer vacuum-deposited organic light-emitting device using a p-type doped silicon anode .
APPLIED PHYSICS LETTERS,
74(4), 609-611. 10.1063/1.123161
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Zhou, X, He, J, Liao, LS
et al
. (1999). Enhanced hole injection in a bilayer vacuum-deposited organic light-emitting device using a p-type doped silicon anode .
APPLIED PHYSICS LETTERS,
74(4), 609-611. 10.1063/1.123161
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cited authors
Zhou, X; He, J; Liao, LS; Lu, M; Xiong, ZH; Ding, XM; Hou, XY; Tao, FG; Zhou, CE; Lee, ST
authors
He, Jin
abstract
We report the fabrication of a vacuum-deposited light-emitting device which emits light from its top surface through an Al cathode using p-type doped silicon as the anode material. Enhanced hole injection is clearly demonstrated from the p-Si anode as compared to the indium-tin-oxide (ITO) anode. The mechanisms of hole injection from both the p-Si and ITO anodes into the organic layer are investigated and a possible model based on anode surface band bending is proposed. During the operation of the organic light-emitting device, the surface band bending of the anode plays a very important role in modifying the interfacial barrier height between the anode and the organic layer. © 1999 American Institute of Physics.
publication date
January 25, 1999
published in
APPLIED PHYSICS LETTERS
Journal
Identifiers
Digital Object Identifier (DOI)
https://doi.org/10.1063/1.123161
Additional Document Info
start page
609
end page
611
volume
74
issue
4