Growth and characterization of hillock-free high quality homoepitaxial diamond films Conference

Wang, CL, Irie, M, Ito, T. Growth and characterization of hillock-free high quality homoepitaxial diamond films . Diamond and Related Materials, 9(9-10), 1650-1654. 10.1016/S0925-9635(00)00295-8

cited authors

  • Wang, CL; Irie, M; Ito, T

authors

date/time interval

  • June 13, 1999 -

published in

keywords

  • CATHODOLUMINESCENCE SPECTROSCOPY
  • CHEMICAL-VAPOR-DEPOSITION
  • DEFECTS
  • DOPED CVD DIAMOND
  • Materials Science
  • Materials Science, Coatings & Films
  • Materials Science, Multidisciplinary
  • Physical Sciences
  • Physics
  • Physics, Applied
  • Physics, Condensed Matter
  • SURFACE
  • Science & Technology
  • Technology
  • band-edge emission
  • cathodoluminescence
  • chemical vapor deposition
  • growth hillocks
  • homoepitaxial diamond
  • pre-treatment

Digital Object Identifier (DOI)

start page

  • 1650

end page

  • 1654

volume

  • 9

issue

  • 9-10