Structural analysis of ion-implanted chemical-vapor-deposited diamond by transmission electron microscope Conference

Jiang, N, Deguchi, M, Wang, CL et al. (1997). Structural analysis of ion-implanted chemical-vapor-deposited diamond by transmission electron microscope . APPLIED SURFACE SCIENCE, 113 254-258. 10.1016/S0169-4332(96)00927-0

Industry Collaboration

cited authors

  • Jiang, N; Deguchi, M; Wang, CL; Won, JH; Jeon, HM; Mori, Y; Hatta, A; Kitabatake, M; Ito, T; Hirao, T; Sasaki, T; Hiraki, A

authors

date/time interval

  • July 1, 1996 -

publication date

  • April 1, 1997

webpage

published in

keywords

  • BEAM
  • CONDUCTIVITY
  • CVD diamond
  • Chemistry
  • Chemistry, Physical
  • DAMAGE
  • FILMS
  • Materials Science
  • Materials Science, Coatings & Films
  • Physical Sciences
  • Physics
  • Physics, Applied
  • Physics, Condensed Matter
  • Science & Technology
  • TEM
  • TEM grid
  • Technology
  • VOLUME EXPANSION
  • critical dose
  • ion implantation
  • structural transformation

Location

  • OSAKA, JAPAN

Digital Object Identifier (DOI)

Conference

  • 8th International Conference on Solid Films and Surfaces (ICSFS-8)

publisher

  • ELSEVIER SCIENCE BV

start page

  • 254

end page

  • 258

volume

  • 113