Interface characterization of chemical-vapour-deposited diamond on Cu and Pt substrates studied by transmission electron microscopy Conference

Jiang, N, Wang, CL, Won, JH et al. (1997). Interface characterization of chemical-vapour-deposited diamond on Cu and Pt substrates studied by transmission electron microscopy . APPLIED SURFACE SCIENCE, 117 587-591. 10.1016/S0169-4332(97)80147-X

cited authors

  • Jiang, N; Wang, CL; Won, JH; Joen, MH; Mori, Y; Hatta, A; Ito, T; Sasaki, T; Hiraki, A

authors

date/time interval

  • October 28, 1996 -

publication date

  • June 1, 1997

webpage

published in

keywords

  • CVD diamond
  • Chemistry
  • Chemistry, Physical
  • Cu and Pt substrates
  • GROWTH
  • HREM
  • Materials Science
  • Materials Science, Coatings & Films
  • NUCLEATION
  • Physical Sciences
  • Physics
  • Physics, Applied
  • Physics, Condensed Matter
  • Science & Technology
  • Technology
  • graphite
  • intermediate layer

Location

  • KARUIZAWA, JAPAN

Digital Object Identifier (DOI)

Conference

  • 2nd International Symposium on the Control of Semiconductor Interfaces (ISCSI-2)

publisher

  • ELSEVIER SCIENCE BV

start page

  • 587

end page

  • 591

volume

  • 117