Ion beam analysis of PECVD silicon oxide thin films Article

Fernandez-Lima, F, Rodriguez, JA, Pedrero, E et al. (2006). Ion beam analysis of PECVD silicon oxide thin films . NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 243(1), 200-204. 10.1016/j.nimb.2005.07.244

International Collaboration

keywords

  • AFM
  • DEPOSITION
  • Instruments & Instrumentation
  • Nuclear Science & Technology
  • Physical Sciences
  • Physics
  • Physics, Atomic, Molecular & Chemical
  • Physics, Nuclear
  • RBS
  • STRESS
  • Science & Technology
  • Technology
  • ion beam analysis
  • silicon oxide

Digital Object Identifier (DOI)

publisher

  • ELSEVIER SCIENCE BV

start page

  • 200

end page

  • 204

volume

  • 243

issue

  • 1