Ion beam analysis of PECVD silicon oxide thin films Article

Fernandez-Lima, F, Rodriguez, JA, Pedrero, E et al. (2006). Ion beam analysis of PECVD silicon oxide thin films . Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms, 243(1), 200-204. 10.1016/j.nimb.2005.07.244

International Collaboration

cited authors

  • Fernandez-Lima, F; Rodriguez, JA; Pedrero, E; Filho, HDF; Llovera, A; Riera, M; Dominguez, C; Behar, M; Zawislak, FC

authors

publication date

  • January 1, 2006

published in

keywords

  • AFM
  • DEPOSITION
  • Instruments & Instrumentation
  • Nuclear Science & Technology
  • Physical Sciences
  • Physics
  • Physics, Atomic, Molecular & Chemical
  • Physics, Nuclear
  • RBS
  • STRESS
  • Science & Technology
  • Technology
  • ion beam analysis
  • silicon oxide

Digital Object Identifier (DOI)

start page

  • 200

end page

  • 204

volume

  • 243

issue

  • 1