Sub-10-nm-resolution electron-beam lithography toward very-high-density multilevel 3D nano-magnetic information devices Article

Lee, Beomseop, Hong, Jeongmin, Amos, Nissim et al. (2013). Sub-10-nm-resolution electron-beam lithography toward very-high-density multilevel 3D nano-magnetic information devices . JOURNAL OF NANOPARTICLE RESEARCH, 15(6), 10.1007/s11051-013-1665-7

cited authors

  • Lee, Beomseop; Hong, Jeongmin; Amos, Nissim; Dumer, Ilya; Litvinov, Dmitri; Khizroev, Sakhrat

authors

publication date

  • June 1, 2013

webpage

published in

keywords

  • Bit-patterned-media
  • Chemistry
  • Chemistry, Multidisciplinary
  • Electron-beam lithography
  • FABRICATION
  • Magnetoelectronic devices
  • Materials Science
  • Materials Science, Multidisciplinary
  • Nanoscience & Nanotechnology
  • Optimal lithography
  • PATTERNED MEDIA
  • Physical Sciences
  • Science & Technology
  • Science & Technology - Other Topics
  • Technology

Digital Object Identifier (DOI)

publisher

  • SPRINGER

volume

  • 15

issue

  • 6