Electron microscopy studies of ion implanted silicon for seeding electroless copper films Article

Muralidhar, GK, Bhansali, S, Pogany, A et al. (1998). Electron microscopy studies of ion implanted silicon for seeding electroless copper films . JOURNAL OF APPLIED PHYSICS, 83(11), 5709-5713. 10.1063/1.367425

keywords

  • POLYIMIDE
  • Physical Sciences
  • Physics
  • Physics, Applied
  • Science & Technology

Digital Object Identifier (DOI)

publisher

  • AMER INST PHYSICS

start page

  • 5709

end page

  • 5713

volume

  • 83

issue

  • 11